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IEICE Trans

Keyword : clean surface

Sequential Dry Cleaning System for Highly-Controlled Silicon Surfaces
Takashi ITO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3 ; pp. 375-381
Type of Manuscript:  Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: High-Performance Processing
Keyword: 
ULSI, clean surface, native oxide, photo-excitation, hydrogen termination, 
 Summary | Full Text:PDF