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IEICE Trans

Keyword : chelating agent

A Model for the Electrochemical Deposition and Removal of Metallic Impurities on Si Surfaces
Hitoshi MORINAGA Makoto SUYAMA Masashi NOSE Steven VERHAVERBEKE Tadahiro OHMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3 ; pp. 343-362
Type of Manuscript:  Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: High-Performance Processing
Keyword: 
metallic impurities, metal-induced pits, redox poten-tial, surfactant, chelating agent, 
 Summary | Full Text:PDF