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Multiscale Simulation of Diffusion, Deactivation and Segregation of Boron in Silicon
Wolfgang WINDL | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 2003/03/01
Vol. E86-C
No. 3 ;
pp. 269-275
Type of Manuscript:
INVITED PAPER (Special Issue on the 2002 IEEE International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'02))
Category:
Keyword:
ab-initio, boron, diffusion, deactivation, segregation, | | | Summary | Full Text:PDF | |
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