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IEICE Trans

Keyword : PtHf-alloy target

Etching Control of HfN Encapsulating Layer for PtHf-Silicide Formation with Dopant Segregation Process
Shun-ichiro OHMI Yuya TSUKAMOTO Rengie Mark D. MAILIG 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2019/06/01
Vol. E102-C  No. 6 ; pp. 453-457
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
PtHf-alloy silicide, PtHf-alloy target, selective etching, contact resistivity, dopant segregation, RF magnetron sputtering, 
 Summary | Full Text:PDF
PtHf Silicide Formation Utilizing PtHf-Alloy Target for Low Contact Resistivity
Shun-ichiro OHMI Mengyi CHEN Xiaopeng WU Yasushi MASAHIRO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2016/05/01
Vol. E99-C  No. 5 ; pp. 510-515
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
PtHf-alloy target, PtHf-alloy silicide, contact resistivity, Schottky barrier height, RF magnetron sputtering, 
 Summary | Full Text:PDF