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IEICE Trans

Keyword : Pt gate electrode

Kr-Plasma Sputtering for Pt Gate Electrode Deposition on MFSFET with 5 nm-Thick Ferroelectric Nondoped HfO2 Gate Insulator for Analog Memory Application
Joong-Won SHIN Masakazu TANUMA Shun-ichiro OHMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2023/10/01
Vol. E106-C  No. 10 ; pp. 581-587
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
5 nm-thick ferroelectric nondoped HfO2, Pt gate electrode, Kr-plasma sputtering, MFSFET, partial polarization, analog memory application, 
 Summary | Full Text:PDF
MFSFET with 5nm Thick Ferroelectric Nondoped HfO2 Gate Insulator Utilizing Low Power Sputtering for Pt Gate Electrode Deposition
Joong-Won SHIN Masakazu TANUMA Shun-ichiro OHMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2022/10/01
Vol. E105-C  No. 10 ; pp. 578-583
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
ferroelectric, 5nm thick nondoped HfO2, RF magnetron sputtering, Pt gate electrode, PMA process, 
 Summary | Full Text:PDF