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IEICE Trans

Keyword : MIS structure

Direct Photo Chemical Vapor Deposition of Silicon Nitride and Its Application to MIS Structre
Masahiro YOSHIMOTO Kenji TAKUBO Takashi SAITO Tetsuya OHTSUKI Michio KOMODA Hiroyuki MATSUNAMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/09/25
Vol. E75-C  No. 9 ; pp. 1019-1024
Type of Manuscript:  Special Section PAPER (Special Issue on Silicon Devices and Materials)
Category: 
Keyword: 
direct photo-CVD, silicon nitride, MIS structure, interface states, rapid thermal anneal, 
 Summary | Full Text:PDF