The Effect of PMA with TiN Gate Electrode on the Formation of Ferroelectric Undoped HfO2 Directly Deposited on Si(100) Min Gee KIMShun-ichiro OHMI
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2019/06/01 Vol. E102-CNo. 6 ;
pp. 435-440 Type of Manuscript: Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices) Category: Keyword: ferroelectric HfO2, undoped HfO2, post-metallization annealing, MFS diodes,