Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 2022/10/01
Vol. E105-C
No. 10 ;
pp. 584-588
Type of Manuscript:
Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Keyword: ferroelectric HfO2, RF magnetron sputtering, Hf inter layer, chemical oxide inter layer, |