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IEICE Trans

Keyword : ArF

Improvement of ArF Photo Resist Pattern by VUV Cure
Hisakazu MIYATAKE Takashi ITO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2007/05/01
Vol. E90-C  No. 5 ; pp. 1006-1011
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Lithography-Related Techniques
Keyword: 
UV cure, ArF, resist, dry etching resistance, LER, 
 Summary | Full Text:PDF