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IEICE Trans

Yuichi MIYOSHI

Particle Growth Caused by Film Deposition in VLSI Manufacturing Process
Yoshimasa TAKII Yuichi MIYOSHI Yuichi HIROFUJI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3  pp. 312-316
Type of Manuscript:  Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: Particle/Defect Control and Analysis
Keyword: 
particle growth, particle, defect, clean technology, film deposition, 
 Summary | Full Text:PDF