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IEICE Trans

Yu-ichiro ANDO

Low Temperature Hetero-Epitaxy of Ferromagnetic Silicide on Ge Substrates for Spin-Transistor Application
Yu-ichiro ANDO Koji UEDA Mamoru KUMANO Taizoh SADOH Kazumasa NARUMI Yoshihito MAEDA Masanobu MIYAO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2008/05/01
Vol. E91-C  No. 5  pp. 708-711
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
ferromagnetic silicide, Fe3Si, Ge, molecular beam epitaxy, 
 Summary | Full Text:PDF