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IEICE Trans

Yoshiki EBIKO

Effects of N2O Plasma Treatment for Low Temperature Polycrystalline Silicon TFTs
Yoshiki EBIKO Yasuyoshi MISHIMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2002/11/01
Vol. E85-C  No. 11  pp. 1838-1843
Type of Manuscript:  Special Section PAPER (Special Issue on Electronic Displays)
Category: Active Matrix Displays
Keyword: 
TFT reliability, N2O plasma treatment, hot carrier reliability, gate oxide stability, trap density, 
 Summary | Full Text:PDF