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IEICE Trans

Uma KRISHNAMOORTHY

Lithography Process for Trench Pattern above Large Cavity to Fabricate Fast Scanning Micromirror
Hiroyuki WADA Daesung LEE Stefan ZAPPE Uma KRISHNAMOORTHY Olav SOLGAARD 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2004/08/01
Vol. E87-C  No. 8  pp. 1395-1398
Type of Manuscript:  LETTER
Category: Electromechanical Devices and Components
Keyword: 
MEMS, micromachine, lithography process, scanning mirror, combdrives, 
 Summary | Full Text:PDF