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IEICE Trans

Tsuyoshi YOSHII

Application of KrF Excimer Laser Lithography to 256 MbDRAM Fabrication
Sin-ichi FUKUZAWA Hiroshi YOSHINO Shinji ISHIDA Kenji KONDOH Tsuyoshi YOSHII Naoaki AIZAKI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/11/25
Vol. E76-C  No. 11  pp. 1665-1669
Type of Manuscript:  Special Section LETTER (Special Issue on LSI Memories)
Category: Application Specific Memory
Keyword: 
DRAM, KrF excimer laser, lithography double-layer resist, triple-layer resist, 
 Summary | Full Text:PDF