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IEICE Trans

Tohru NAKAMURA


Shallow p-Type Layers in Si by Rapid Vapor-Phase Doping for High-Speed Bipolar and MOS Applications
Yukihiro KIYOTA Tohru NAKAMURA Seiji SUZUKI Taroh INADA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/04/25
Vol. E79-C  No. 4  pp. 554-559
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra-High-Speed LSIs)
Category: 
Keyword: 
RVD, shallow-junction bipolar, MOS, 
 Summary | Full Text:PDF

Test Structure and Experimental Analysis of Emitter-Base Reverse Voltage Stress Degradation in Self-Aligned Bipolar Transistors
Hiromi SHIMAMOTO Masamichi TANABE Takahiro ONAI Katsuyoshi WASHIO Tohru NAKAMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/02/25
Vol. E79-C  No. 2  pp. 211-218
Type of Manuscript:  Special Section PAPER (Special Issue on Microelectronic Test Structures)
Category: Reliability Analysis
Keyword: 
self-aligned bipolar transistor, hot-carrier, emitter-base reverse voltage stress, 
 Summary | Full Text:PDF

Process and Device Technologies for High Speed Self-Aligned Bipolar Transistors
Tohru NAKAMURA Takeo SHIBA Takahiro ONAI Takashi UCHINO Yukihiro KIYOTA Katsuyoshi WASHIO Noriyuki HOMMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1995/09/25
Vol. E78-C  No. 9  pp. 1154-1164
Type of Manuscript:  INVITED PAPER (Special Issue on Ultra-High-Speed Electron Devices)
Category: 
Keyword: 
silicon bipolar, double polysilicon, high speed, self-alignment, 
 Summary | Full Text:PDF

High-Speed High-Density Self-Aligned PNP Technology for Low-Power Complementary Bipolar ULSIs
Katsuyoshi WASHIO Hiromi SHIMAMOTO Tohru NAKAMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1995/04/25
Vol. E78-C  No. 4  pp. 353-359
Type of Manuscript:  Special Section PAPER (Special Issue on Low-Voltage, Low-Power Integrated Circuits)
Category: Device Technology
Keyword: 
high-speed high-density self-aligned pnp, complementary bipolar ULSIs, high-speed and low-power performance, fully compatibility with npn, 
 Summary | Full Text:PDF

Subquarter-Micrometer PMOSFET's with 50-nm Source and Drain Formed by Rapid Vapor-Phase Doping (RVD)
Yukihiro KIYOTA Tohru NAKAMURA Taroh INADA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3  pp. 362-366
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Device Technology
Keyword: 
PMOSFET, RVD, shallow-junction, 
 Summary | Full Text:PDF

Soft-Error Immune 180-µm2 SICOS Upward Transistor Memory Cell for Ultra-High-Speed High-Density Bipolar RAMs
Youji IDEI Takeo SHIBA Noriyuki HOMMA Kunihiko YAMAGUCHI Tohru NAKAMURA Takahiro ONAI Youichi TAMAKI Yoshiaki SAKURAI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/11/25
Vol. E75-C  No. 11  pp. 1369-1376
Type of Manuscript:  Special Section PAPER (Special Issue on LSI Memories)
Category: 
Keyword: 
soft error, SICOS, bipolar RAM, 256 Kbit, 
 Summary | Full Text:PDF