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IEICE Trans

Tetsuya TATSUMI

Characteristics of a-Si: H Thin Films Fabricated at Various Substrate Bias Outside of Microwave Discharge Plasma
Kazunari ISHIMARU Tetsuya TATSUMI Isamu KATO 
Publication:   IEICE TRANSACTIONS (1976-1990)
Publication Date: 1988/04/25
Vol. E71-E  No. 4  pp. 299-300
Type of Manuscript:  Special Section LETTER (Special Issue: Papers from 1988 Spring Convention IEICE)
Category: Semiconductor Devices and Integrated Circuits
Keyword: 
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