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IEICE Trans

Tatsuhiro YASAKA

Native Oxide Growth on Hydrogen-Terminated Silicon Surfaces
Tatsuhiro YASAKA Masaru TAKAKURA Kenichi SAWARA Shigeo UENAGA Hiroshi YASUTAKE Seiichi MIYAZAKI Masataka HIROSE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7  pp. 764-769
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
HF-treated Si, hydrogen termination, layer-by-layer oxidation, XPS, FT-IR-ATR, 
 Summary | Full Text:PDF