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IEICE Trans

Takashi IMAOKA

The Segregation and Removal of Metallic Impurities at the Interface of Silicon Wafer Surface and Liquid Chemicals
Takashi IMAOKA Takehiko KEZUKA Jun TAKANO Isamu SUGIYAMA Tadahiro OHMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7  pp. 816-828
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
metallic impurity, segregation, wafer cleaning, 
 Summary | Full Text:PDF