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IEICE Trans

Sunao ISHIHARA


Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing
Kokoro KATO Masakazu ENDO Tadao INOUE Shigetoshi NAKATAKE Masaki YAMABE Sunao ISHIHARA 
Publication:   IEICE TRANSACTIONS on Fundamentals of Electronics, Communications and Computer Sciences
Publication Date: 2010/12/01
Vol. E93-A  No. 12  pp. 2424-2432
Type of Manuscript:  Special Section PAPER (Special Section on VLSI Design and CAD Algorithms)
Category: Device and Circuit Modeling and Analysis
Keyword: 
Mask Data Rank (MDR)design intentDFMMDP
 Summary | Full Text:PDF