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IEICE Trans

Shinya HASEGAWA


Dynamic-Clustering and Grain-Growth Kinetics Effects on Dopant Diffusion in Polysilicon
Masami HANE Shinya HASEGAWA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/02/25
Vol. E77-C  No. 2  pp. 112-117
Type of Manuscript:  Special Section PAPER (Special Issue on 1993 VLSI Process and Device Modeling Workshop (VPAD 93))
Category: Process Simulation
Keyword: 
poly-silicondiffusionmodelingsimulation
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