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IEICE Trans

Shigeki SHIMOMURA

Optimization of Photolithography Developing Process without Residual Surfactant on Surfaces
Hisayuki SHIMADA Shigeki SHIMOMURA Kouichi HIROSE Masanobu ONODERA Tadahiro OHMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7  pp. 844-851
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
developer, surfactant, carbon, hydrogen peroxide, ozone, 
 Summary | Full Text:PDF