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IEICE Trans

Scott T. DUNHAM

The Process Modeling Hierarchy: Connecting Atomistic Calculations to Nanoscale Behavior
Scott T. DUNHAM Pavel FASTENKO Zudian QIN Milan DIEBEL 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2003/03/01
Vol. E86-C  No. 3  pp. 276-283
Type of Manuscript:  INVITED PAPER (Special Issue on the 2002 IEEE International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'02))
Category: 
Keyword: 
atomistic, diffusion, activation, doping fluctuations, silicon, 
 Summary | Full Text:PDF
Modeling of Dopant Diffusion in Silicon
Scott T. DUNHAM Alp H. GENCER Srinivasan CHAKRAVARTHI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1999/06/25
Vol. E82-C  No. 6  pp. 800-812
Type of Manuscript:  INVITED PAPER (Special Issue on TCAD for Semiconductor Industries)
Category: 
Keyword: 
dopant diffusion, point defects, silicon, interstitial, vacancy, dopant/defect pairing, coupled diffusion, pair diffusion, diffusivity, equilibrium concentration, metal diffusion, lattice Monte Carlo, 
 Summary | Full Text:PDF