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IEICE Trans

Masuo KAJIYAMA

Efficient Wafer-Level Spatial Variation Modeling for Multi-Site RF IC Testing
Riaz-ul-haque MIAN Tomoki NAKAMURA Masuo KAJIYAMA Makoto EIKI Michihiro SHINTANI 
Publication:   IEICE TRANSACTIONS on Fundamentals of Electronics, Communications and Computer Sciences
Publication Date: 2024/08/01
Vol. E107-A  No. 8  pp. 1139-1150
Type of Manuscript:  PAPER
Category: VLSI Design Technology and CAD
Keyword: 
wafer-level spatial characteristic modeling, Gaussian process regression, LSI test, 
 Summary | Full Text:PDF
Wafer-Level Characteristic Variation Modeling Considering Systematic Discontinuous Effects
Takuma NAGAO Tomoki NAKAMURA Masuo KAJIYAMA Makoto EIKI Michiko INOUE Michihiro SHINTANI 
Publication:   IEICE TRANSACTIONS on Fundamentals of Electronics, Communications and Computer Sciences
Publication Date: 2024/01/01
Vol. E107-A  No. 1  pp. 96-104
Type of Manuscript:  Special Section PAPER (Special Section on Circuits and Systems)
Category: 
Keyword: 
wafer-level spatial characteristic modeling, process variation, Gaussian process regression, 
 Summary | Full Text:PDF