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IEICE Trans

Masayuki NAKAO

Fast Atom Beam (FAB) Processing with Separated Masks
Masahiro HATAKEYAMA Katsunori ICHIKI Tadasuke KOBATA Masayuki NAKAO Yotaro HATAMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1995/02/25
Vol. E78-C  No. 2  pp. 174-179
Type of Manuscript:  Special Section PAPER (Special Issue on Micromachines and Micro Electro Mechanical Systems)
Category: 
Keyword: 
fast atom beam (FAB), patterned mask, GaAs, 3-D processing, overlapped etching, 
 Summary | Full Text:PDF