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IEICE Trans

Maki KOSUGE

A Novel Electron Beam Resist System Convertible into Silicate Glass
Toshio ITO Miwa SAKATA Maki KOSUGE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4  pp. 588-593
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
electron beam resist, glass, poly (siloxane), SiO2, O2-RIE, 
 Summary | Full Text:PDF