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IEICE Trans

Keiichiro TOUNAI

Optimization of Optical Parameters in KrF Excimer Laser Lithography for Quarter-Micron Lines Pattern
Keiichiro TOUNAI Kunihiko KASAMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3  pp. 425-431
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
KrF excimer stepper, modified illumination, depth of focus, simulation, 
 Summary | Full Text:PDF