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IEICE Trans

Kei TASHIRO


New Reactive Sputtering Model Considering the Effect of the Electron Emission Coefficiency for MgO Deposition
Yoshinobu MATSUDA Kei TASHIRO Koji OTOMO Hiroshi FUJIYAMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2001/11/01
Vol. E84-C  No. 11  pp. 1667-1672
Type of Manuscript:  Special Section PAPER (Special Issue on Electronic Displays)
Category: Plasma Displays
Keyword: 
MgOmodelingreactive sputteringsecondary electron emission
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