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IEICE Trans

Jun TAKANO

The Segregation and Removal of Metallic Impurities at the Interface of Silicon Wafer Surface and Liquid Chemicals Takashi IMAOKA Takehiko KEZUKA Jun TAKANO Isamu SUGIYAMA Tadahiro OHMI
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 1992/07/25 Vol. E75-C No. 7 pp. 816-828 Type of Manuscript: Special Section PAPER (Special Issue on Ultra Clean Technology) Category: Keyword: metallic impurity, segregation, wafer cleaning,
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Influence of Vacancy in Silicon Wafer of Various Types on Surface Microroughness in Wet Chemical Process Tadahiro OHMI Toshihito TSUGA Jun TAKANO Masahiko KOGURE Koji MAKIHARA Takayuki IMAOKA
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 1992/07/25 Vol. E75-C No. 7 pp. 800-808 Type of Manuscript: Special Section PAPER (Special Issue on Ultra Clean Technology) Category: Keyword: surface microroughness, vacancy, sillicon wafer, wet chemical process, diffusion, MOS diodo, thin oxide film,
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