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IEICE Trans

Jun TAKANO

Influence of Vacancy in Silicon Wafer of Various Types on Surface Microroughness in Wet Chemical Process
Tadahiro OHMI Toshihito TSUGA Jun TAKANO Masahiko KOGURE Koji MAKIHARA Takayuki IMAOKA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7  pp. 800-808
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
surface microroughness, vacancy, sillicon wafer, wet chemical process, diffusion, MOS diodo, thin oxide film, 
 Summary | Full Text:PDF
The Segregation and Removal of Metallic Impurities at the Interface of Silicon Wafer Surface and Liquid Chemicals
Takashi IMAOKA Takehiko KEZUKA Jun TAKANO Isamu SUGIYAMA Tadahiro OHMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7  pp. 816-828
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
metallic impurity, segregation, wafer cleaning, 
 Summary | Full Text:PDF