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IEICE Trans

Jun NAKAYAMA

Current Progress in Epitaxial Layer Transfer (ELTRAN(R))
Kiyofumi SAKAGUCHI Nobuhiko SATO Kenji YAMAGATA Tadashi ATOJI Yasutomo FUJIYAMA Jun NAKAYAMA Takao YONEHARA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1997/03/25
Vol. E80-C  No. 3  pp. 378-387
Type of Manuscript:  INVITED PAPER (Special Issue on SOI Devices and Their Process Technologies)
Category: Wafer Technologies
Keyword: 
porous, BESOI, pre-injection, structure-sensitive etching, hydrogen annealing, edge exclusion, batch process, 
 Summary | Full Text:PDF