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IEICE Trans

Hitoshi NAGATA

Yield Prediction Method Considering the Effect of Particles on Sub-Micron Patterning
Nobuyoshi HATTORI Masahiko IKENO Hitoshi NAGATA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3  pp. 277-281
Type of Manuscript:  Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: CIM/CAM
Keyword: 
yield prediction, pattern defect, photolithography, semiconducter manufacturing, 
 Summary | Full Text:PDF