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IEICE Trans

Hitoshi MORINAGA


A Model for the Electrochemical Deposition and Removal of Metallic Impurities on Si Surfaces
Hitoshi MORINAGA Makoto SUYAMA Masashi NOSE Steven VERHAVERBEKE Tadahiro OHMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3  pp. 343-362
Type of Manuscript:  Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: High-Performance Processing
Keyword: 
metallic impuritiesmetal-induced pitsredox poten-tialsurfactantchelating agent
 Summary | Full Text:PDF