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IEICE Trans

Hiroo OMI

Separation by Bonding Si Islands (SBSI) for Advanced CMOS LSI Applications
Takashi YAMAZAKI Shun-ichiro OHMI Shinya MORITA Hiroyuki OHRI Junichi MUROTA Masao SAKURABA Hiroo OMI Tetsushi SAKAI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2005/04/01
Vol. E88-C  No. 4  pp. 656-661
Type of Manuscript:  Special Section PAPER (Special Section on Fundamental and Application of Advanced Semiconductor Devices)
Category: Si Devices and Processes
Keyword: 
silicon on insulator (SOI) wafer, patterned SOI, SiGe, selective etching, MOSFET, 
 Summary | Full Text:PDF