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IEICE Trans

Evan WHITBY

2D Simulation of Particle Formation, Growth, and Deposition in Low-Pressure CVDs: Application of CONTAMINATE Version 2.0
Evan WHITBY Koichi TSUZUKI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7  pp. 852-859
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
semiconductor materials and devices, materials, particle dynamics, wafer contamination, 
 Summary | Full Text:PDF