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IEICE Trans

Andrzej J. STROJWAS

METROPOLE-3D: An Efficient and Rigorous 3D Photolithography Simulator
Andrzej J. STROJWAS Xiaolei LI Kevin D. LUCAS 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1999/06/25
Vol. E82-C  No. 6  pp. 821-829
Type of Manuscript:  INVITED PAPER (Special Issue on TCAD for Semiconductor Industries)
Category: 
Keyword: 
modeling, topography simulation, manufacturability, reflective notching, anti-reflective layer, defect, 
 Summary | Full Text:PDF