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IEICE Trans

Akira OZAWA

Tantalum Dry-Etching Characteristics for X-Ray Mask Fabrication
Akira OZAWA Shigehisa OHKI Masatoshi ODA Hideo YOSHIHARA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/02/25
Vol. E77-C  No. 2  pp. 255-262
Type of Manuscript:  PAPER
Category: Integrated Electronics
Keyword: 
X-ray mask, tantalum absorber pattern, reactive ion etching (RIE), electron-cyclotron-resonance (ECR) ion-stream etching, aspect ratio, micro-loading effect, protection effect, 
 Summary | Full Text:PDF