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Recent Situation of the UV Imprint Lithography and Its Application to the Photonics Devices
IEICE TRANSACTIONS on Electronics
Publication Date: 2016/03/01
Online ISSN: 1745-1353
Type of Manuscript: INVITED PAPER (Special Section on Progress towards System Nanotechnology)
UV-imprint lithography, PDMS, LN filter, dry etching, sapphire substrate, alumina nanohole,
Full Text: FreePDF
The individual steps of UV imprint lithography have been explained in detail from the points of manufacturing nano-structures. The applications to photonic devices have been also introduced.