Recent Situation of the UV Imprint Lithography and Its Application to the Photonics Devices

Masashi NAKAO  

Publication
IEICE TRANSACTIONS on Electronics   Vol.E99-C   No.3   pp.333-338
Publication Date: 2016/03/01
Online ISSN: 1745-1353
DOI: 10.1587/transele.E99.C.333
Type of Manuscript: INVITED PAPER (Special Section on Progress towards System Nanotechnology)
Category: 
Keyword: 
UV-imprint lithography,  PDMS,  LN filter,  dry etching,  sapphire substrate,  alumina nanohole,  

Full Text: FreePDF


Summary: 
The individual steps of UV imprint lithography have been explained in detail from the points of manufacturing nano-structures. The applications to photonic devices have been also introduced.