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A Structured Routing Architecture for Practical Application of Character Projection Method in Electron-Beam Direct Writing
Rimon IKENO Takashi MARUYAMA Satoshi KOMATSU Tetsuya IIZUKA Makoto IKEDA Kunihiro ASADA
IEICE TRANSACTIONS on Fundamentals of Electronics, Communications and Computer Sciences
Publication Date: 2014/08/01
Online ISSN: 1745-1337
Type of Manuscript: PAPER
Category: VLSI Design Technology and CAD
Electron Beam Direct Writing, Character Projection, routing, interconnect, VIA,
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To improve throughput of Electron Beam Direct Writing (EBDW) with Character Projection (CP) method, a structured routing architecture (SRA) has been proposed to restrict VIA placement and wire-track transition. It reduces possible layout patterns in the interconnect layers, and increases VIA and metal figure numbers in the EB shots while suppressing the CP character number explosion. In this paper, we discuss details of the SRA design methodology, and demonstrate the CP performance by SRA in comparison with other EBDW techniques. Our experimental results show viable CP performance for practical use, and prove SRA's feasibility in 14nm mass fabrication.