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Deposition of Inclined Magnetic Anisotropy Film by Oblique Incidence Collimated Sputtering
Naoki HONDA Akito HONDA
IEICE TRANSACTIONS on Electronics
Publication Date: 2013/12/01
Online ISSN: 1745-1353
Print ISSN: 0916-8516
Type of Manuscript: Special Section PAPER (Special Section on Advanced Elementary Technologies for Information Storage)
inclined anisotropy, oblique incidence collimated sputtering, patterned media, magnetic properties,
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Deposition of inclined anisotropy film for bit-patterned media was studied using an oblique incidence collimated sputtering. Pt underlayer increased the inclination angle of magnetic layer more than 5° on a Ta seed layer. Further increase of the angle was obtained by annealing Pt/Ru underlayer resulting an inclination angle of 9.4° for a Co-Cr15.5 film on the underlayer. The magnetic properties of the Co-Cr15.5 film with an inclined orientation was estimated comparing measured hysteresis loops with simulated ones, which indicated to have inclined magnetic anisotropy with an anisotropy field of about 4.5kOe and a deflection angle of the anisotropy about the same as that of the crystalline orientation.