Deposition of Inclined Magnetic Anisotropy Film by Oblique Incidence Collimated Sputtering

Naoki HONDA  Akito HONDA  

Publication
IEICE TRANSACTIONS on Electronics   Vol.E96-C   No.12   pp.1469-1473
Publication Date: 2013/12/01
Online ISSN: 1745-1353
DOI: 10.1587/transele.E96.C.1469
Print ISSN: 0916-8516
Type of Manuscript: Special Section PAPER (Special Section on Advanced Elementary Technologies for Information Storage)
Category: 
Keyword: 
inclined anisotropy,  oblique incidence collimated sputtering,  patterned media,  magnetic properties,  

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Summary: 
Deposition of inclined anisotropy film for bit-patterned media was studied using an oblique incidence collimated sputtering. Pt underlayer increased the inclination angle of magnetic layer more than 5° on a Ta seed layer. Further increase of the angle was obtained by annealing Pt/Ru underlayer resulting an inclination angle of 9.4° for a Co-Cr15.5 film on the underlayer. The magnetic properties of the Co-Cr15.5 film with an inclined orientation was estimated comparing measured hysteresis loops with simulated ones, which indicated to have inclined magnetic anisotropy with an anisotropy field of about 4.5kOe and a deflection angle of the anisotropy about the same as that of the crystalline orientation.