Effect of Impurity in Discharge Gas on High γ Properties of Newly Developed CeSrO Film for Novel Plasma Display Panel

Yasuhiro YAMAUCHI  Yusuke FUKUI  Yosuke HONDA  Michiko OKAFUJI  Masahiro SAKAI  Mikihiko NISHITANI  Yasushi YAMAUCHI  

Publication
IEICE TRANSACTIONS on Electronics   Vol.E95-C   No.11   pp.1761-1768
Publication Date: 2012/11/01
Online ISSN: 1745-1353
DOI: 10.1587/transele.E95.C.1761
Print ISSN: 0916-8516
Type of Manuscript: INVITED PAPER (Special Section on Electronic Displays)
Category: 
Keyword: 
PDP,  γ,  protective layer,  discharge,  MgO,  

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Summary: 
The discharge properties and chemical surface stability of CeO2 containing Sr (CeSrO) as the candidate for high-γ protective layer of noble plasma display panels (PDPs) are characterized. CeSrO films have superior chemical stability, because of the decrease in reactiveness on surface due to their fluorite structure. The discharge voltage is 50 V lower than that of MgO films for a pure discharge gas of Ne/Xe = 85/15 at 60 kPa. However the topmost surface, monolayer, of the CeSrO film relevant to the discharge property is hardly recovered from the damage by CO2 impurity in discharge gas. We can expect that by pumping down to a sufficiently low CO2 partial pressure (lower than 1 10-3 Pa), PDP panels with very high efficiency are realized with CeSrO protective layer.