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Slit-Mura Detection through Non-contact Optical Measurements of In-Line Spectrometer for TFT-LCDs
Fu-Ming TZU Jung-Hua CHOU
IEICE TRANSACTIONS on Electronics
Publication Date: 2009/03/01
Online ISSN: 1745-1353
Print ISSN: 0916-8516
Type of Manuscript: PAPER
Category: Electronic Displays
TFT-LCD, slit Mura, spectrometer, thickness, chromaticity,
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Slit-Mura defect is a notorious yield flaw of color filters. In this study, an innovative non-contact in-line optical inspection method is developed to detect low contrast slit Mura through quantitative measurements by a spectrometer. Using the features of either thickness or chromaticity profiles across a slit Mura, a thickness difference from 21 nm to 41 nm of color filters can be differentiated accurately. Thus, the quality of color filters can be accessed in-line during the manufacturing process TFT-LCDs.