Slit-Mura Detection through Non-contact Optical Measurements of In-Line Spectrometer for TFT-LCDs

Fu-Ming TZU  Jung-Hua CHOU  

Publication
IEICE TRANSACTIONS on Electronics   Vol.E92-C   No.3   pp.364-369
Publication Date: 2009/03/01
Online ISSN: 1745-1353
DOI: 10.1587/transele.E92.C.364
Print ISSN: 0916-8516
Type of Manuscript: PAPER
Category: Electronic Displays
Keyword: 
TFT-LCD,  slit Mura,  spectrometer,  thickness,  chromaticity,  

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Summary: 
Slit-Mura defect is a notorious yield flaw of color filters. In this study, an innovative non-contact in-line optical inspection method is developed to detect low contrast slit Mura through quantitative measurements by a spectrometer. Using the features of either thickness or chromaticity profiles across a slit Mura, a thickness difference from 21 nm to 41 nm of color filters can be differentiated accurately. Thus, the quality of color filters can be accessed in-line during the manufacturing process TFT-LCDs.