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Recent Progresses of Si-Based Photonics in Chinese Main Land
Jinzhong YU Qiming WANG Buwen CHENG Saowu CHEN Yuhua ZUO
IEICE TRANSACTIONS on Electronics
Publication Date: 2008/02/01
Online ISSN: 1745-1353
Print ISSN: 0916-8516
Type of Manuscript: INVITED PAPER (Special Section on Silicon Photonics Technologies and Their Applications)
nanocrystals, PL, quantum dot, SOI, optical switch matrix, photodiodes,
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Si-based photonic materials and devices, including SiGe/Si quantum structures, SOI and InGaAs bonded on Si, PL of Si nanocrystals, SOI photonic crystal filter, Si based RCE (Resonant Cavity Enhanced) photodiodes, SOI TO (thermai-optical) switch matrix were investigated in Institute of Semiconductors, Chinese Academy of Sciences. The main results in recent years are presented in the paper. The mechanism of PL from Si NCs embedded in SiO2 matrix was studied, a greater contribution of the interface state recombination (PL peak in 850~900 nm) is associated with larger Si NCs and higher interface state density. Ge dots with density of order of 1011 cm-2 were obtained by UHV/CVD growth and 193 nm excimer laser annealing. SOI photonic crystal filter with resonant wavelength of 1598 nm and Q factor of 1140 was designed and made. Si based hybrid InGaAs RCE PD with η of 34.4% and FWHM of 27 nm were achieved by MOCVD growth and bonding technology between InGaAs epitaxial and Si wafers. A 1616 SOI optical switch matrix were designed and made. A new current driving circuit was used to improve the response speed of a 44 SOI rearrangeable nonblocking TO switch matrix, rising and falling time is 970 and 750 ns, respectively.