Simulation Study of Factors That Determine Write Margins in Patterned Media

Naoki HONDA  Kiyoshi YAMAKAWA  Kazuhiro OUCHI  

Publication
IEICE TRANSACTIONS on Electronics   Vol.E90-C   No.8   pp.1594-1598
Publication Date: 2007/08/01
Online ISSN: 1745-1353
DOI: 10.1093/ietele/e90-c.8.1594
Print ISSN: 0916-8516
Type of Manuscript: Special Section PAPER (Special Section on Recent Progress of High-Density Information Storage)
Category: 
Keyword: 
patterned media,  perpendicular anisotropy,  simulation,  shift margin,  

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Summary: 
Shift margins in down and cross track directions and skew angle were investigated using micromagnetic simulation with a shielded planar head for patterned media with an areal density of 1 Tbit/in2. The shift margins were quantitatively estimated using parameters of the head field and the magnetic properties of media. It is essential to use a head with a higher field gradient and a medium with a small field width between saturation and nucleation fields, to obtain a larger down track shift margin, and a head with a narrower cross track field distribution to obtain a larger cross track shift margin and skew angle margin.