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Simulation Study of Factors That Determine Write Margins in Patterned Media
Naoki HONDA Kiyoshi YAMAKAWA Kazuhiro OUCHI
IEICE TRANSACTIONS on Electronics
Publication Date: 2007/08/01
Online ISSN: 1745-1353
Print ISSN: 0916-8516
Type of Manuscript: Special Section PAPER (Special Section on Recent Progress of High-Density Information Storage)
patterned media, perpendicular anisotropy, simulation, shift margin,
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Shift margins in down and cross track directions and skew angle were investigated using micromagnetic simulation with a shielded planar head for patterned media with an areal density of 1 Tbit/in2. The shift margins were quantitatively estimated using parameters of the head field and the magnetic properties of media. It is essential to use a head with a higher field gradient and a medium with a small field width between saturation and nucleation fields, to obtain a larger down track shift margin, and a head with a narrower cross track field distribution to obtain a larger cross track shift margin and skew angle margin.