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A 126 mm2 4-Gb Multilevel AG-AND Flash Memory with Inversion-Layer-Bit-Line Technology
Hideaki KURATA Satoshi NODA Yoshitaka SASAGO Kazuo OTSUGA Tsuyoshi ARIGANE Tetsufumi KAWAMURA Takashi KOBAYASHI Hitoshi KUME Kazuki HOMMA Teruhiko ITO Yoshinori SAKAMOTO Masahiro SHIMIZU Yoshinori IKEDA Osamu TSUCHIYA Kazunori FURUSAWA
IEICE TRANSACTIONS on Electronics
Publication Date: 2007/11/01
Online ISSN: 1745-1353
Print ISSN: 0916-8516
Type of Manuscript: PAPER
Category: Integrated Electronics
flash memory, multilevel, inversion-layer-bit-line, AG-AND,
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A 4-Gb AG-AND flash memory was fabricated by using a 90-nm CMOS technology. To reduce cell size, an inversion-layer-bit-line technology was developed, enabling the elimination of both shallow trench isolations and diffusion layers from the memory cells. The inversion-layer-bit-line technology combined with a multilevel cell technique achieved a bit area 2F2 of 0.0162 µm2, resulting in a chip size of 126 mm2. Both an address and temperature compensation techniques control the resistance of the inversion-layer local bit line. Source-side hot-electron injection programming with self-boosted charge, accumulated in inversion-layer bit lines under assist gates, reduces the dispersal of programming characteristics and also reduces the time overhead of pre-charging the bit lines. This self-boosted charge-injection scheme achieves a programming throughput of 10 MB/s.