Lateral Integration of Zn and Al Dots with Nanometer-Scale Precision by Near Field Optical Chemical Vapor Deposition Using a Sharpened Optical Fiber Probe

Yoh YAMAMOTO  Motonobu KOUROGI  Motoichi OHTSU  Geun Hyoung LEE  Tadashi KAWAZOE  

Publication
IEICE TRANSACTIONS on Electronics   Vol.E85-C   No.12   pp.2081-2085
Publication Date: 2002/12/01
Online ISSN: 
DOI: 
Print ISSN: 0916-8516
Type of Manuscript: Special Section PAPER (Special Issue on Near-Field Optics and Its Applications)
Category: 
Keyword: 
near-field,  optical CVD,  nano structures,  nano fabrication,  

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Summary: 
In-situ position-controlled lateral deposition of nanometer-size Zn and Al dots on a sapphire substrate was accomplished by dissociating diethylzinc and trimethylaluminum using an optical near field on a sharpened optical fiber probe tip. The minimum diameters of the Zn and Al dots deposited were 37 and 25 nm, respectively, comparable with the apex diameter of the fiber probe. By changing the reactant molecules during deposition, nanometric Zn and Al dots were successively deposited on the same sapphire substrate with high precision. The distance between these dots was as short as 100 nm.