For Full-Text PDF, please login, if you are a member of IEICE,|
or go to Pay Per View on menu list, if you are a nonmember of IEICE.
An Optimum Selection of Subfield Pattern for Plasma Displays Based on Genetic Algorithm
Seung-Ho PARK Choon-Woo KIM
IEICE TRANSACTIONS on Electronics
Publication Date: 2001/11/01
Print ISSN: 0916-8516
Type of Manuscript: Special Section PAPER (Special Issue on Electronic Displays)
Category: Plasma Displays
plasma display, subfield pattern, optimization, dynamic false contour, genetic algorithm,
Full Text: PDF>>
A plasma display panel (PDP) represents gray levels by the pulse number modulation technique that results in undesirable dynamic false contours on moving images. Among the various techniques proposed for the reduction of dynamic false contours, the optimization of the subfield pattern can be most easily implemented without the need for any additional dedicated hardware or software. In this paper, a systematic method for selecting the optimum subfield pattern is presented. In the proposed method, a subfield pattern that minimizes the quantitative measure of the dynamic false contour on the predefined test image is selected as the optimum pattern. The selection is made by repetitive calculations based on a genetic algorithm. Quantitative measure of the dynamic false contour calculated by simulation on the test image serves as a criterion for minimization by the genetic algorithm. In order to utilize the genetic algorithm, a structure of a string is proposed to satisfy the requirements for the subfield pattern. Also, three genetic operators for optimization, reproduction, crossover, and mutation, are specially designed for the selection of the optimum subfield pattern.