Control and Improvement of Surface Triangulation for Three-Dimensional Process Simulation

Eberhard BAR  Jurgen LORENZ  

IEICE TRANSACTIONS on Electronics   Vol.E83-C    No.8    pp.1338-1342
Publication Date: 2000/08/25
Online ISSN: 
Print ISSN: 0916-8516
Type of Manuscript: Special Section PAPER (Special Issue on 1999 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'99))
Category: Numerics
semiconductor technology,  process simulation,  surface triangulation,  grid generation,  

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Appropriate meshes are crucial for accurate and efficient 3D process simulation. In this paper, we present a set of tools operating on surface and interface triangulations. These tools allow the improvement of the accuracy of interfaces, the reduction of the number of triangles, and the removal of obtuse not coplanarily compensated triangles. The first tool is used within integrated topography simulation environments based on different data structures, e.g. cell-based and segment-based. The latter two are particularly important for providing appropriate input to mesh generation for 3D process simulation.