Deposition of Polymeric Thin Films by Ionization-Assisted Method

Hiroaki USUI  

IEICE TRANSACTIONS on Electronics   Vol.E83-C   No.7   pp.1128-1133
Publication Date: 2000/07/25
Online ISSN: 
Print ISSN: 0916-8516
Type of Manuscript: INVITED PAPER (Special Issue on Organic Molecular Electronics for the 21st Century)
Category: Thin Film
ionization-assisted deposition,  deposition polymerization,  piezoelectric,  organic LED,  

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Polymeric thin films can be prepared by physical vapor deposition in several manners such as direct evaporation of the polymer, co-evaporation of two monomers followed by polyaddition or polycondensation reaction, or evaporation of single monomer followed by chain polymerization. The ionization-assisted deposition (IAD) was proposed as a new method of polymer deposition that has special features such as activation of polymerization reaction and aligning of the dipole orientation. These mechanisms were utilized for the formation of vinyl polymer and polyurea thin films aiming for such applications as organic light emitting diodes and piezoelectric devices.