A Design Hierarchy of IC Interconnects and Gate Patterns

Shinji ODANAKA
Akio MISAKA
Kyoji YAMASHITA

Publication
IEICE TRANSACTIONS on Electronics   Vol.E82-C    No.6    pp.948-954
Publication Date: 1999/06/25
Online ISSN: 
DOI: 
Print ISSN: 0916-8516
Type of Manuscript: Special Section INVITED PAPER (Special Issue on TCAD for Semiconductor Industries)
Category: 
Keyword: 
TCAD,  interconnect,  OPC,  gate pattern,  design rule,  

Full Text: PDF>>
Buy this Article


Summary: 
A new design hierarchy in TCAD is discussed with emphasis on a design of IC interconnects and gate patterns. Two design methodologies for gate patterns at a CMOS cell level and multilevel interconnect scheme at a chip level are proposed. This approach generates the layout design rules of gate patterns, considering the fabrication process and pattern layout dependency, and allows a design of multilevel interconnect scheme at the initial phase of technology development.