Design and Development of 3-Dimensional Process Simulator

Tetsunori WADA  Norihiko KOTANI  

Publication
IEICE TRANSACTIONS on Electronics   Vol.E82-C   No.6   pp.839-847
Publication Date: 1999/06/25
Online ISSN: 
DOI: 
Print ISSN: 0916-8516
Type of Manuscript: INVITED PAPER (Special Issue on TCAD for Semiconductor Industries)
Category: 
Keyword: 
semiconductor,  process simulator,  design,  file format,  

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Summary: 
Design concepts and backgrounds of a 3-dimensional semiconductor process simulator are presented. It is designed to become a basis of developing semiconductor process models. An input language is designed to realize flexibly controlling simulation sequence, and its interpreter program is designed to accept external software to be controlled and to be integrated into a system. To realize data-exchanges between the process simulator and other software, a self-describing data-file format is designed and related program libraries are developed. A C++ class for solving drift-diffusion type partial-differential-equation in a three-dimensional space is developed.