FDM/WDM Couplers Using Silica Waveguide Deposited by APCVD

Tadahiko HANADA  Tuyoshi SHIMODA  Mitsuhiro KITAMURA  Sinichi NAKAMURA  

IEICE TRANSACTIONS on Electronics   Vol.E80-C   No.1   pp.130-133
Publication Date: 1997/01/25
Online ISSN: 
Print ISSN: 0916-8516
Type of Manuscript: Special Section PAPER (Special Issue on Devices, Packaging Technology, and Subsystems for the Optical Access Network)
optical waveguide coupler,  Mach-Zehnder interforemeter,  silica,  

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We describe the design, fabrication, and characteristics of FDM/WDM coupler deposited by TEOS-O3 based APCVD method on silicon substrates. Due to drastically reduced birefringence by APCVD process, completely polarization independent narrow band (100 GHz) Mach-Zehnder type FDM coupler was obtained. We also fabricated 1.3/1.55 µm directional coupler type WDM coupler with very low insertion loss.